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Investigation of α-sialon formation by high temperature X-ray diffraction
Luleå tekniska universitet.
Luleå tekniska universitet.
Luleå tekniska universitet.
1994 (engelsk)Inngår i: Key Engineering Materials, ISSN 1013-9826, E-ISSN 1662-9795, Vol. 89-91, s. 373-380Artikkel i tidsskrift (Fagfellevurdert) Published
Abstract [en]

A technique for following sialon formation in situ by high temperature x-ray diffraction (HT-XRD) was developed. The composition chosen for study was an yttrium α-sialon with x = 0.4. Powder compacts containing silicon nitride, aluminum nitride and yttria powders were pre-sintered at 1350 °C and then studied by HT-XRD at temperatures between 1450 and 1580 °C and nitrogen pressures of 0.11 MPa. The furnace was made from graphite coated with porous silicon nitride/silicon carbide. The coating prevented silicon carbide formation in the sample up to 1600 °C. X-ray diffraction results show the formation of a Y10Al2Si3O18N4 phase at 1350 °C, which dissolved to form α-sialon and other phases at higher temperatures. The amounts of α-sialon formed are similar to the amounts reported by other authors. An empirical method was used for the calculation of activation energy for the silicon nitride to α-sialon transformation and resulted in a value of 330 kJ mol-1.

sted, utgiver, år, opplag, sider
1994. Vol. 89-91, s. 373-380
HSV kategori
Forskningsprogram
Materialteknik
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URN: urn:nbn:se:ltu:diva-9671DOI: 10.4028/www.scientific.net/KEM.89-91.373Scopus ID: 2-s2.0-0028320126Lokal ID: 855d78e0-fc8f-11db-b816-000ea68e967bOAI: oai:DiVA.org:ltu-9671DiVA, id: diva2:982609
Konferanse
Proceedings of the International Conference on Silicon Nitride-Based Ceramics, 4 October 1993 through 6 October 1993, Stuttgart, Germany
Merknad

Godkänd; 1994; 20070507 (cira);

ISBN for host publication: 0-87849-668-8

Tilgjengelig fra: 2016-09-29 Laget: 2016-09-29 Sist oppdatert: 2023-11-14bibliografisk kontrollert

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