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Image analysis applied to film thickness measurements with white light interferometry
Luleå University of Technology, Department of Computer Science, Electrical and Space Engineering, Embedded Internet Systems Lab.
1994 (English)In: Color science, systems and applications: final programm and proceedings [of] The Second IS&T/SID Color Imaging Conference ; November 15 -18, 1994, The Radisson Resort, Scottsdale, Arizona, Springfield, Va: 010 Publishers, 1994, 186-189 p.Conference paper (Refereed)
Abstract [en]

White light interferometry yields good resolution in thin film thickness measurements. Hue value variations vs. film thickness variations are complex and furthermore dependent on the power spectrum of the light source. Absolute film thickness measurements is possible using white light interferometry

Place, publisher, year, edition, pages
Springfield, Va: 010 Publishers, 1994. 186-189 p.
Research subject
Industrial Electronics
URN: urn:nbn:se:ltu:diva-34160ScopusID: 33646220262Local ID: 84713680-0a01-11dd-ae49-000ea68e967bISBN: 892081805 OAI: diva2:1007410
IS&T/SID Color Imaging Conference : 15/11/1994 - 18/11/1994
Godkänd; 1994; 20080414 (cira)Available from: 2016-09-30 Created: 2016-09-30Bibliographically approved

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