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Image analysis applied to film thickness measurements with white light interferometry
Luleå University of Technology, Department of Computer Science, Electrical and Space Engineering, Embedded Internet Systems Lab.
1994 (English)In: Color science, systems and applications: final programm and proceedings [of] The Second IS&T/SID Color Imaging Conference ; November 15 -18, 1994, The Radisson Resort, Scottsdale, Arizona, Springfield, Va: 010 Publishers, 1994, p. 186-189Conference paper, Published paper (Refereed)
Abstract [en]

White light interferometry yields good resolution in thin film thickness measurements. Hue value variations vs. film thickness variations are complex and furthermore dependent on the power spectrum of the light source. Absolute film thickness measurements is possible using white light interferometry
Place, publisher, year, edition, pages
Springfield, Va: 010 Publishers, 1994. p. 186-189
National Category
Other Electrical Engineering, Electronic Engineering, Information Engineering
Research subject
Industrial Electronics
Identifiers
URN: urn:nbn:se:ltu:diva-34160Scopus ID: 2-s2.0-33646220262Local ID: 84713680-0a01-11dd-ae49-000ea68e967bOAI: oai:DiVA.org:ltu-34160DiVA, id: diva2:1007410
Conference
IS&T/SID Color Imaging Conference : 15/11/1994 - 18/11/1994
Note

Godkänd; 1994; 20080414 (cira);

ISBN:892081805

Available from: 2016-09-30 Created: 2016-09-30 Last updated: 2021-10-24Bibliographically approved

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Marklund, OlovGustafsson, Lennart

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