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Computational studies of the HWCVD deposition process during amorphous and nanocrystalline silicon films
Nurni, Viswanathan
ORCID iD:
0000-0003-0278-1333
Adhikari, Subhra
Dusane, R.O.
2006 (English)
Conference paper, Oral presentation only (Refereed)
Place, publisher, year, edition, pages
2006.
Identifiers
URN:
urn:nbn:se:ltu:diva-35695
Local ID: a57a9d0f-df60-4860-b3d9-b1b673a0abbf
OAI: oai:DiVA.org:ltu-35695
DiVA, id:
diva2:1008948
Conference
International Conference on HWCVD (Cat-CVD) Processes : 04/10/2006 - 08/10/2006
Note
Upprättat; 2006; 20130205 (andbra)
Available from:
2016-09-30
Created:
2016-09-30
Last updated:
2018-05-28
Bibliographically approved
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