Computational studies of the HWCVD deposition process during amorphous and nanocrystalline silicon films

Nurni, Viswanathan; Adhikari, Subhra; Dusane, R.O.

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Computational studies of the HWCVD deposition process during amorphous and nanocrystalline silicon films

Nurni, Viswanathan

Adhikari, Subhra

Dusane, R.O.

2006 (English)Conference paper, (Refereed)

Place, publisher, year, edition, pages

2006.

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URN: urn:nbn:se:ltu:diva-35695Local ID: a57a9d0f-df60-4860-b3d9-b1b673a0abbfOAI: oai:DiVA.org:ltu-35695DiVA: diva2:1008948

Conference

International Conference on HWCVD (Cat-CVD) Processes : 04/10/2006 - 08/10/2006

Note

Upprättat; 2006; 20130205 (andbra)Available from: 2016-09-30 Created: 2016-09-30Bibliographically approved

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http://ltu.diva-portal.org/smash/record.jsf?pid=diva2:1008948

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