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Computational studies of the HWCVD deposition process during amorphous and nanocrystalline silicon films
ORCID iD: 0000-0003-0278-1333
2006 (English)Conference paper, Oral presentation only (Refereed)
Place, publisher, year, edition, pages
2006.
Identifiers
URN: urn:nbn:se:ltu:diva-35695Local ID: a57a9d0f-df60-4860-b3d9-b1b673a0abbfOAI: oai:DiVA.org:ltu-35695DiVA, id: diva2:1008948
Conference
International Conference on HWCVD (Cat-CVD) Processes : 04/10/2006 - 08/10/2006
Note
Upprättat; 2006; 20130205 (andbra)Available from: 2016-09-30 Created: 2016-09-30 Last updated: 2018-05-28Bibliographically approved

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Nurni, Viswanathan

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