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Computational studies of the HWCVD deposition process during amorphous and nanocrystalline silicon films
2006 (English)Conference paper, (Refereed)
Place, publisher, year, edition, pages
2006.
Identifiers
URN: urn:nbn:se:ltu:diva-35695Local ID: a57a9d0f-df60-4860-b3d9-b1b673a0abbfOAI: oai:DiVA.org:ltu-35695DiVA: diva2:1008948
Conference
International Conference on HWCVD (Cat-CVD) Processes : 04/10/2006 - 08/10/2006
Note
Upprättat; 2006; 20130205 (andbra)Available from: 2016-09-30 Created: 2016-09-30Bibliographically approved

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CiteExportLink to record
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Cite
Citation style
  • apa
  • harvard1
  • ieee
  • modern-language-association-8th-edition
  • vancouver
  • Other style
More styles
Language
  • de-DE
  • en-GB
  • en-US
  • fi-FI
  • nn-NO
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Output format
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