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Synthesis of silicon oxynitride by hot isostatic pressing
Luleå tekniska universitet.
ASEA Cerama AB.
1988 (English)In: HIP: proceedings of the International Conference on Hot Isostatic Pressing, Luleå, 15-17 June 1987 / [ed] Tore Garvare, Luleå: CENTEK , 1988, 375-381 p.Conference paper (Refereed)
Abstract [en]

Silicon oxynitride, Si sub 2 N sub 2 O, is an interesting material often formed on the surface of a silicon nitride component during sintering. This material could be of considerable interest as an intermediate layer in joints between silicon nitride and superalloys if machining of the joint area of the ceramic part is to be avoided. This work is part of the development of solid state bonding methods for the joining of silicon nitride to superalloys by HIP. It presents the first step in the development, the optimization of the synthesis of pure silicon oxynitride during densification by HIP. The achievements and the direction of future work are discussed. Graphs, Photomicrographs

Place, publisher, year, edition, pages
Luleå: CENTEK , 1988. 375-381 p.
Research subject
Engineering Materials
URN: urn:nbn:se:ltu:diva-38737Local ID: d36d3480-88d3-11de-8da0-000ea68e967bISBN: 91-86998-34-XOAI: diva2:1012238
International Conference on Hot Isostatic Pressing : 15/06/1987 - 17/06/1987
Godkänd; 1988; 20090814 (andbra)Available from: 2016-10-03 Created: 2016-10-03Bibliographically approved

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