Zeolite Y films were synthesized on polished α-alumina wafers by using a seeding technique which includes surface modification, seed adsorption and growth of the seed crystals into a dense film. The film thickness was found to be a linear function of synthesis duration up to a certain point. Further treatment reduced the film thickness. Continuous and crack free films with thicknesses in the range 210 to 2670 nm were synthesized in this work.