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Modelling ink spreading on self-assembled monolayers for nanopatterning applications
Tyndall National Institute, Lee Makings, Prospect Row, Cork.
Tyndall National Institute, Lee Makings, Prospect Row, Cork.
Tyndall National Institute, Lee Makings, Prospect Row, Cork.
2008 (English)Conference paper, Poster (Refereed)
Abstract [en]

Alkanethiol self-assembled monolayers (SAMs) on gold; specifically the Au(111) surface; have been widely studied since their discovery in the early 1980 s. The interest in SAMs is due in part to their ease of production but also due to their present and potential application in technologies as diverse as biosensors; corrosion protection and nanolithography. Spreading of ink outside the desired printed area is one of the major limitations of microcontact printing (m-CP) with alkanethiol self-assembled monolayers (SAMs) on gold.1;2 We use molecular dynamics (MD) computer simulations to quantify the temperature and concentration dependence of hexadecanethiol (HDT) ink spreading on HDT SAMs; modelling 18 distinct printing conditions using periodic simulation cells of ~7 nm edge length and printing conditions ranging from 7 ink molecules per cell at 270 K to 42 ink molecules per cell at 371K.3 The computed alkanethiol ink diffusion rates on the SAM are of the same order of magnitude as bulk liquid alkanethiol diffusion rates at all but the lowest ink concentrations and highest temperatures; with up to 20-30 times increases in diffusion rates at the lowest concentration-highest temperature conditions. We show that although alkanethiol surfaces are autophobic; autophobicity is not enough to pin the ink solutions on the SAM and so any over-inking of the SAM will lead to spreading of the printed pattern. Comparison of experimental and calculated diffusion data supports an interpretation of pattern broadening as a mixture of spreading on fully- and partially-formed SAMs; and the calculated spreading rates establish some of the fundamental limitations of m-CP in terms of stamp contact time and desired pattern width

Place, publisher, year, edition, pages
URN: urn:nbn:se:ltu:diva-39440Local ID: e3523def-c1cc-407a-b05a-c3a6742f550dOAI: diva2:1012953
Self-assembly and self-organisation at surfaces and interfaces : 10/12/2008 - 12/12/2008
Upprättat; 2008; 20130422 (andbra)Available from: 2016-10-03 Created: 2016-10-03

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