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Tunable Localized Surface Plasmon Resonance and Broadband Visible Photoresponse of Cu Nanoparticles/ZnO Surfaces
Université de Lorraine, CNRS, IJL, F-54000 Nancy, France. Department of Materials Science and Engineering, Saarland University, Saarbrücken, Germany.
Université de Lorraine, CNRS, IJL, Nancy, France.
LCP-A2MC, Institut Jean Barriol, Université de Lorraine, Metz, France.
LCP-A2MC, Institut Jean Barriol, Université de Lorraine, Metz, France.
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2018 (English)In: ACS Applied Materials and Interfaces, ISSN 1944-8244, E-ISSN 1944-8252, Vol. 10, no 47, p. 40958-40965Article in journal (Refereed) Published
Abstract [en]

Plasmonic Cu nanoparticles (NP) were successfully deposited on ZnO substrates by atomic layer deposition (ALD) owing to the Volmer–Weber island growth mode. An evolution from Cu NP to continuous Cu films was observed with an increasing number of ALD cycles. Real and imaginary parts of the NP dielectric functions, determined by spectroscopic ellipsometry using an effective medium approach, evidence a localized surface plasmon resonance that can be tuned between the visible and near-infrared ranges by controlling the interparticle spacing and size of the NP. The resulting Cu NP/ZnO device shows an enhanced photoresponse under white light illumination with good responsivity values, fast response times, and stability under dark/light cycles. The significant photocurrent detected for this device is related to the hot-electron generation at the NP surface and injection into the conduction band of ZnO. The possibility of tuning the plasmon resonance together with the photoresponsivity of the device is promising in many applications related to photodetection, photonics, and photovoltaics.

Place, publisher, year, edition, pages
American Chemical Society (ACS), 2018. Vol. 10, no 47, p. 40958-40965
Keywords [en]
atomic layer deposition, copper nanoparticles, hot electrons, localized surface plasmon resonance, photodetectors
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Other Physics Topics
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Experimental Physics
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URN: urn:nbn:se:ltu:diva-71637DOI: 10.1021/acsami.8b17194ISI: 000451932800064PubMedID: 30398332Scopus ID: 2-s2.0-85056897869OAI: oai:DiVA.org:ltu-71637DiVA, id: diva2:1264001
Note

Validerad;2018;Nivå 2;2018-12-04 (inah)

Available from: 2018-11-19 Created: 2018-11-19 Last updated: 2019-09-13Bibliographically approved

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Rigoni, FedericaAlmqvist, NilsVomiero, Alberto

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