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Bulk and monolayer bismuth oxyiodide (BiOI): Excellent high temperature p-type thermoelectric materials
Luleå University of Technology, Department of Engineering Sciences and Mathematics, Material Science.ORCID iD: 0000-0001-6659-9771
Department of Physics, Khalifa University of Science and Technology, Abu Dhabi, United Arab Emirates.
Luleå University of Technology, Department of Engineering Sciences and Mathematics, Material Science.ORCID iD: 0000-0003-3455-2877
2020 (English)In: AIP Advances, E-ISSN 2158-3226, Vol. 10, no 7, article id 075309Article in journal (Refereed) Published
Abstract [en]

We have combined first-principles and semiclassical Boltzmann transport theory to demonstrate the potential superb electronic and thermal transport properties of bulk and monolayer bismuth oxyiodide (BiOI). The exfoliation energy required to produce monolayer BiOI (22.53 meV/angstrom (2)) is lower than that required to produce monolayer h-BN, implying possible manufacturing from bulk. The calculated phonon frequencies, complemented with an ab initio molecular dynamic simulation for 8 ps at elevated temperature (900 K), reveal the monolayer’s dynamic and structural stability. The calculated band gaps are indirect for both bulk and monolayer and amount to 2.04 eV and 2.07 eV, respectively. Our results indicate remarkably high Seebeck coefficients for BiOI in the bulk (227 mu V/K at a hole concentration of 9.00 x 10(20) cm(-3)) and in the monolayer form (200 mu V/K at a hole concentration of 8.14 x 10(13) cm(-2)) at 900 K. The lowest lattice thermal conductivities of 1.35 W/mK for the bulk and 1.44 W/mK for the monolayer are obtained at 900 K. Because of the high value of S-2 sigma/tau for p-type doping, the figure of merit achieves peak values of 1.51 at a carrier concentration of 8.44 x 10(20) cm(-3) for bulk BiOI and 1.61 at a carrier concentration of 4.27 x 10(13) cm(-2) for monolayer BiOI.

Place, publisher, year, edition, pages
American Institute of Physics (AIP), 2020. Vol. 10, no 7, article id 075309
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Applied Physics
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URN: urn:nbn:se:ltu:diva-80508DOI: 10.1063/1.5133711ISI: 000551869100003Scopus ID: 2-s2.0-85090149415OAI: oai:DiVA.org:ltu-80508DiVA, id: diva2:1459707
Note

Validerad;2020;Nivå 2;2020-08-20 (johcin)

Available from: 2020-08-20 Created: 2020-08-20 Last updated: 2023-09-05Bibliographically approved

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Sajjad, MuhammadLarsson, Andreas J.

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