Photocatalytic performance of Cu-doped titania thin films under UV light irradiationShow others and affiliations
2021 (English)In: Applied Surface Science, ISSN 0169-4332, E-ISSN 1873-5584, Vol. 553, article id 149535Article in journal (Refereed) Published
Abstract [en]
We investigated the effect of copper doping on the photocatalytic properties of TiO2 thin films. Titania thin films doped with three different copper concentrations were synthesized via radiofrequency-assisted (RF) magnetron sputtering, then annealed at 600 °C in controlled atmosphere (Ar, O2, H2 flow). The impact of the annealing in inert, oxidizing or reducing atmosphere on the crystalline and surface structure, and photocatalytic performance in the methylene blue degradation under UV light irradiation was investigated by X-ray diffraction, UV-Vis Spectroscopy, Rutherford Backscattering Spectrometry, electron scanning microscopy. Annealing induced very different crystallization in different atmospheres, with strong copper out-diffusion in samples annealed in reducing atmosphere and formation of large embedded nanoparticles. The Cu-doped titania films exhibited higher photocatalytic activity than pure titania film and the best performing catalyst, treated in H2 atmosphere, suggests that the presence of embedded copper nanoparticles (both metallic and oxidized) is able to strongly enhance the photocatalytic properties of the host titania matrix. Incorporated Cu particles can act as trapped sites for generated electrons, and this leads to the reduction of carrier recombination which, ultimately, plays a significant role in the increase of photoactivity. The recyclability of the best system was ascertained by a suitable 3-cycle stability test.
Place, publisher, year, edition, pages
Elsevier, 2021. Vol. 553, article id 149535
Keywords [en]
Cu:TiO2 thin films, physical vapour deposition, PVD, Methylene blue photocatalytic degradation
National Category
Materials Chemistry
Research subject
Experimental Physics
Identifiers
URN: urn:nbn:se:ltu:diva-83262DOI: 10.1016/j.apsusc.2021.149535ISI: 000639668700001Scopus ID: 2-s2.0-85102837835OAI: oai:DiVA.org:ltu-83262DiVA, id: diva2:1537138
Funder
The Kempe FoundationsKnut and Alice Wallenberg Foundation
Note
Validerad;2021;Nivå 2;2021-04-07 (alebob)
2021-03-152021-03-152021-05-20Bibliographically approved