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Sequential physical vapor deposition and chemical vapor deposition for the growth of In2O3-SnO2 radial and longitudinal heterojunctions
SENSOR Lab, CNR INO, Via Branze 45, 25123 Brescia, Italy; SENSOR Lab, Department of Information Engineering and the Materials, University of Brescia, Via Valotti 9, 25133 Brescia, Italy.ORCID iD: 0000-0003-2935-1165
SENSOR Lab, CNR INO, Via Branze 45, 25123 Brescia, Italy; SENSOR Lab, Department of Information Engineering and the Materials, University of Brescia, Via Valotti 9, 25133 Brescia, Italy.
CNR-IENI, Via F. Marzolo 1, 35131 Padova, Italy; Department of Chemical Sciences, Padova University, Via F. Marzolo 1, 35131 Padova, Italy.
Institute of Inorganic Chemistry, University of Cologne, Greinstrasse 6, D-50939 Cologne, Germany.
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2014 (English)In: Applied Surface Science, ISSN 0169-4332, E-ISSN 1873-5584, Vol. 323, no 30, p. 59-64Article in journal (Refereed) Published
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2014. Vol. 323, no 30, p. 59-64
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URN: urn:nbn:se:ltu:diva-2630DOI: 10.1016/j.apsusc.2014.07.177ISI: 000345511600011Scopus ID: 2-s2.0-84919423412Local ID: 04529d8a-97dc-43bb-999c-040d970f01f2OAI: oai:DiVA.org:ltu-2630DiVA, id: diva2:975483
Available from: 2016-09-29 Created: 2016-09-29 Last updated: 2024-08-20Bibliographically approved

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