Change search
CiteExportLink to record
Permanent link

Direct link
Cite
Citation style
  • apa
  • harvard1
  • ieee
  • modern-language-association-8th-edition
  • vancouver
  • Other style
More styles
Language
  • de-DE
  • en-GB
  • en-US
  • fi-FI
  • nn-NO
  • nn-NB
  • sv-SE
  • Other locale
More languages
Output format
  • html
  • text
  • asciidoc
  • rtf
The influence of mixed cationic-anionic surfactants on the three-phase contact parameters in silica-solution systems
Institute of Physical Chemistry, Bulgarian Academy of Sciences.
Luleå University of Technology, Department of Civil, Environmental and Natural Resources Engineering, Sustainable Process Engineering.
Department of Inorganic Chemistry, University of Sofia.
Show others and affiliations
2011 (English)In: Colloids and Surfaces A: Physicochemical and Engineering Aspects, ISSN 0927-7757, E-ISSN 1873-4359, Vol. 373, no 1-3, p. 145-151Article in journal (Refereed) Published
Abstract [en]

The formation of thin wetting films on silica surface from aqueous solution of a) tetradecyltrimetilammonium bromide (C14TAB) and (b) surfactant mixture of the cationic C14TAB with the anionic sodium alkyl- (straight chain C12-, C14- and C16-) sulfonates, was studied using the microscopic thin wetting film method developed by Platikanov. Film lifetimes, three-phase contact (TPC) expansion rates, receding contact angles and surface tension were measured. It was found that the mixed surfactants caused lower contact angles, lower rates of the thin aqueous film rupture and longer film lifetimes, as compared to the pure C14TAB. This behavior was explained by the strong initial adsorption of interfacial complexes from the mixed surfactant system at the air/solution interface, followed by adsorption at the silica interface. The formation of the interfacial complexes at the air/solution interface was proved by means of the surface tension data. It was also shown, that the chain length compatibility between the anionic and cationic surfactants controls the strength of the interfacial complex and causes synergistic lowering in the surface tension. The film rupture mechanism was explained by the heterocoagulation mechanism between the positively charged air/solution interface and the solution/silica interface, which remained negatively charged.

Place, publisher, year, edition, pages
2011. Vol. 373, no 1-3, p. 145-151
National Category
Metallurgy and Metallic Materials
Research subject
Mineral Processing
Identifiers
URN: urn:nbn:se:ltu:diva-3685DOI: 10.1016/j.colsurfa.2010.10.040Local ID: 182bc110-edad-11df-8b36-000ea68e967bOAI: oai:DiVA.org:ltu-3685DiVA: diva2:976545
Note
Validerad; 2011; 20101111 (ysko)Available from: 2016-09-29 Created: 2016-09-29 Last updated: 2017-11-24Bibliographically approved

Open Access in DiVA

No full text in DiVA

Other links

Publisher's full text

Search in DiVA

By author/editor
Kota, Hanumantha RaoForssberg, EricPugh, R.J.
By organisation
Sustainable Process Engineering
In the same journal
Colloids and Surfaces A: Physicochemical and Engineering Aspects
Metallurgy and Metallic Materials

Search outside of DiVA

GoogleGoogle Scholar

doi
urn-nbn

Altmetric score

doi
urn-nbn
Total: 37 hits
CiteExportLink to record
Permanent link

Direct link
Cite
Citation style
  • apa
  • harvard1
  • ieee
  • modern-language-association-8th-edition
  • vancouver
  • Other style
More styles
Language
  • de-DE
  • en-GB
  • en-US
  • fi-FI
  • nn-NO
  • nn-NB
  • sv-SE
  • Other locale
More languages
Output format
  • html
  • text
  • asciidoc
  • rtf