Degradation of boron-doped Czochralski-grown silicon solar cellsShow others and affiliations
2004 (English)In: Physical Review Letters, ISSN 0031-9007, E-ISSN 1079-7114, Vol. 93, no 5, p. 055504-1Article in journal (Refereed) Published
Abstract [en]
The formation mechanism and properties of the boron-oxygen center responsible for the degradation of Czochralski-grown Si(B) solar cells during operation is investigated using density functional calculations. We find that boron traps an oxygen dimer to form a bistable defect with a donor level in the upper half of the band gap. The activation energy for its dissociation is found to be 1.2 eV. The formation of the defect from mobile oxygen dimers, which are shown to migrate by a Bourgoin mechanism under minority carrier injection, has a calculated activation energy of 0.3 eV. These energies and the dependence of the generation rate of the recombination center on boron concentration are in good agreement with observations.
Place, publisher, year, edition, pages
2004. Vol. 93, no 5, p. 055504-1
National Category
Computational Mathematics
Research subject
Scientific Computing
Identifiers
URN: urn:nbn:se:ltu:diva-4600DOI: 10.1103/PhysRevLett.93.055504ISI: 000222996800032Scopus ID: 2-s2.0-69349106228Local ID: 291402f0-c357-11db-9ea3-000ea68e967bOAI: oai:DiVA.org:ltu-4600DiVA, id: diva2:977474
Note
Validerad; 2004; 20070215 (kani);
For erratum, see: Adey, J., Jones, R., Palmer, D. W., Briddon, P. R., & Öberg, S. (2004). Erratum: Degradation of Boron-Doped Czochralski-Grown Silicon Solar Cells [Phys. Rev. Lett., 93, 055504 (2004)]. Physical Review Letters, 93(16), 169904. https://doi.org/10.1103/PhysRevLett.93.169904
2016-09-292016-09-292023-10-24Bibliographically approved