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Tailoring of silicon crystals for relativistic-particle channeling
University of Ferrara.
University of Ferrara.
University of Ferrara.
University of Ferrara.
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2005 (English)In: Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, ISSN 0168-583X, E-ISSN 1872-9584, Vol. 234, no 1-2, p. 40-46Article in journal (Refereed) Published
Abstract [en]

In the last years, the research on channeling of relativistic particles has progressed considerably. A significant contribution has been provided by the development of techniques for quality improvement of the crystals. In particular, a planar etching of the surfaces of the silicon crystals proved useful to remove the superficial layer, which is a region very rich in imperfections, in turn leading to greater channeling efficiency. Micro-fabrication techniques, borrowed from silicon technology, may also be useful: micro-indentation and deposition of tensile or compressive layers onto silicon samples allow one to impart an even curvature to the samples. In this way, different topologies may be envisaged, such as a bent crystal for deflection of protons and ions or an undulator to force coherent oscillations of positrons and electrons. © 2005 Elsevier B.V. All rights reserved.

Place, publisher, year, edition, pages
2005. Vol. 234, no 1-2, p. 40-46
Keywords [en]
Channeling, Micromachining, Surface treatments
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Other Physics Topics
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Experimental Physics
Identifiers
URN: urn:nbn:se:ltu:diva-5150DOI: 10.1016/j.nimb.2005.01.008ISI: 000230191100006Scopus ID: 2-s2.0-19944406525Local ID: 32dccff6-d053-44ea-8b07-ef62685e33afOAI: oai:DiVA.org:ltu-5150DiVA, id: diva2:978024
Note

Upprättat; 2005; 20141216 (albvom)

Available from: 2016-09-29 Created: 2016-09-29 Last updated: 2018-10-04Bibliographically approved

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Vomiero, Alberto

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