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Influence of sputtering target power on microstructure and mechanical properties of W-N and Ta-N coatings
Key Laboratory of Materials Physics, Institute of Solid State Physics, Chinese Academy of Sciences, Hefei.
Luleå University of Technology, Department of Engineering Sciences and Mathematics, Machine Elements.ORCID iD: 0000-0003-1454-1118
Key Laboratory of Materials Physics, Institute of Solid State Physics, Chinese Academy of Sciences, Hefei.
Key Laboratory of Materials Physics, Institute of Solid State Physics, Chinese Academy of Sciences, Hefei.
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2012 (English)In: Nanoscience and Nanotechnology Letters, ISSN 1941-4900, E-ISSN 1941-4919, Vol. 4, no 6, p. 604-608Article in journal (Refereed) Published
Abstract [en]

W-N and Ta-N coatings were manufactured using r.f. reactive magnetron sputtering technique in mixed atmosphere of Ar+N 2. The effect of sputtering power on the microstructure and mechanical properties of these coatings has been investigated. It was found that increasing sputtering power induced structure transformation of W-N and Ta-N coatings from hexagonal WN to fcc ω-W2N and from fcc TaN through a mixture of orthorhombic Ta3N5 and fcc TaN to orthorhombic Ta3N5, respectively. The increase in sputtering power led to grain refinement which played a major role in hardness enhancement. At the highest sputtering power of 100W, the average grain size of Ta-N and W-N coatings reduced to minimum value of 7 nm and 21 nm, correspondingly the hardness reached maximum value of 29 GPa and 31 GPa, respectively. However, Ta-N and W-N coatings possessed the biggest adhesion strength of ̃41 N and ̃48 N at the lowest sputtering power of 40 W and 25 W, respectively.

Place, publisher, year, edition, pages
2012. Vol. 4, no 6, p. 604-608
National Category
Tribology (Interacting Surfaces including Friction, Lubrication and Wear)
Research subject
Machine Elements
Identifiers
URN: urn:nbn:se:ltu:diva-5738DOI: 10.1166/nnl.2012.1372Local ID: 3eb461f9-5f12-43ab-acd7-4678e7e90738OAI: oai:DiVA.org:ltu-5738DiVA: diva2:978613
Note
Godkänd; 2012; 20120820 (andbra)Available from: 2016-09-29 Created: 2016-09-29 Last updated: 2018-01-10Bibliographically approved

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