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Synthesis and characterization of nano-crystalline CVD diamond film on pure titanium using Ar/CH 4/H 2 gas mixture
Department of High Tech Thin Films, School of Materials Science and Engineering, University of Science and Technology Beijing.
Department of High Tech Thin Films, School of Materials Science and Engineering, University of Science and Technology Beijing.ORCID iD: 0000-0003-4888-6237
Department of High Tech Thin Films, School of Materials Science and Engineering, University of Science and Technology Beijing.
Department of High Tech Thin Films, School of Materials Science and Engineering, University of Science and Technology Beijing.
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2007 (English)In: Materials letters (General ed.), ISSN 0167-577X, E-ISSN 1873-4979, Vol. 61, no 11-12, p. 2139-2142Article in journal (Refereed) Published
Abstract [en]

Titanium and Ti alloys have poor tribological properties and deposition of a well adherent diamond coating is a promising way to solve this problem. But diamond film deposition on pure titanium and Ti alloys is always difficult due to the high diffusion coefficient of carbon in Ti, the large mismatch in their thermal expansion coefficients, the complex nature of the interlayer formed during diamond deposition, and the difficulty of achieving very high nucleation density. A nano-crystalline diamond (NCD) film can resolve Ti and Ti alloys weak tribological performance due to its smooth surface. A well-adhered NCD film was successfully deposited on pure Ti substrate by using a microwave plasma assisted chemical vapor deposition (MWPCVD) system in the environment of Ar, CH4 and H2 gases at a moderate temperature. Detailed experimental results on the preparation, characterization and successful deposition of the NCD film on pure Ti are discussed

Place, publisher, year, edition, pages
2007. Vol. 61, no 11-12, p. 2139-2142
National Category
Other Materials Engineering
Research subject
Engineering Materials
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URN: urn:nbn:se:ltu:diva-7294DOI: 10.1016/j.matlet.2006.08.033Local ID: 5a3b55b5-6a4f-49f7-a24b-9a2bbf818281OAI: oai:DiVA.org:ltu-7294DiVA: diva2:980183
Note
Upprättat; 2007; 20150416 (farakh)Available from: 2016-09-29 Created: 2016-09-29 Last updated: 2017-11-24Bibliographically approved

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