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Behaviour of Si and Ti doped carbon composites under exposure to the deuterium plasma
Alfvén Laboratory, Royal Institute of Technology, Association EURATOM -NFR.
Luleå University of Technology, Department of Engineering Sciences and Mathematics, Material Science.ORCID iD: 0000-0003-1646-569X
Institute of Plasma Physics, Forschungszentrum - Jülich, Association EURATOM.
NET Team, Max-Planck-Institute for Plasma Physics.
1998 (English)In: Journal of Nuclear Materials, ISSN 0022-3115, E-ISSN 1873-4820, Vol. 258-263, no 1, p. 787-792Article in journal (Refereed) Published
Abstract [en]

Studies of the deuterium interaction with carbon-based substrates were performed for graphite doped either with SiC or with TiC (5% or 10% of Si or Ti) and carbon fibre composites doped with SiC (2.5; 8; 40% of carbide). Non-doped CFC and graphite were used as reference materials. The materials were exposed to the deuterium plasma in a tokamak or in simulators of plasma-surface interactions. The main emphasis was on the determination of the deuterium retention in the near surface region and in the bulk of the composites. Characterisation of the non-exposed and deuterium irradiated substrates was accomplished by means of RBS, NRA, EDS, laser profilometry and ultra-high resolution microscopies. The most important observations are connected with the penetration of the deposited deuterium into the bulk of composites - even a few millimetres beneath the surface. The rate of the process was found to be related to the structure of materials and, to a certain extent, to the content of dopants.

Place, publisher, year, edition, pages
1998. Vol. 258-263, no 1, p. 787-792
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Fysik
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URN: urn:nbn:se:ltu:diva-7768DOI: 10.1016/S0022-3115(98)00257-8ISI: 000077277000121Local ID: 6301e820-e6b5-11db-8a98-000ea68e967bOAI: oai:DiVA.org:ltu-7768DiVA, id: diva2:980658
Note
Godkänd; 1998; 20070409 (ysko)Available from: 2016-09-29 Created: 2016-09-29 Last updated: 2018-07-10Bibliographically approved

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