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Surface microstructural changes of Spark Plasma Sintered Zirconia after grinding and annealing
Luleå University of Technology, Department of Engineering Sciences and Mathematics, Material Science.
Luleå University of Technology, Department of Civil, Environmental and Natural Resources Engineering, Chemical Engineering.ORCID iD: 0000-0003-4582-0902
CIEFMA—Department of Materials Science and Metallurgical Engineering, ETSEIB, Universitat Politècnica de Catalunya.
Luleå University of Technology, Department of Engineering Sciences and Mathematics, Material Science.ORCID iD: 0000-0003-4888-6237
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Number of Authors: 62016 (English)In: Ceramics International, ISSN 0272-8842, E-ISSN 1873-3956, Vol. 42, no 14, p. 15610-15617Article in journal (Refereed) Published
Abstract [en]

Spark plasma sintered zirconia (3Y-TZP) specimens have been produced of 140 nm 372 nm and 753 nm grain sizes by sintering at 1250 C, 1450 C and 1600 C, respectively. The sintered zirconia specimens were grinded using a diamond grinding disc with an average diamond particle size of about 60 µm, under a pressure of 0.9 MPa. The influence of grinding and annealing on the grain size has been analysed. It was shown that thermal etching after of ruff grinding of specimens at 1100 C for one hour induced an irregular surface layer of about a few hundred nanometres in thickness of recrystallized nano-grains, independently of the initial grain size. However, if the ground specimens were exposed to higher temperature, e.g. annealing at 1575 °C for one hour, the nano-grain layer was not observed and the final grain size was similar to that achieved by the same heat treatments on carefully polished specimens. Therefore, by appropriate grinding and thermal etching treatments, nanograined surface layer can be obtained which increases the resistance to low temperature degradation.

Place, publisher, year, edition, pages
2016. Vol. 42, no 14, p. 15610-15617
National Category
Other Materials Engineering Chemical Process Engineering
Research subject
Engineering Materials; Chemical Technology
Identifiers
URN: urn:nbn:se:ltu:diva-7853DOI: 10.1016/j.ceramint.2016.07.014ISI: 000382269800061Scopus ID: 2-s2.0-84994234920Local ID: 64656baf-1342-4451-92db-db1edc6357deOAI: oai:DiVA.org:ltu-7853DiVA, id: diva2:980743
Note

Validerad; 2016; Nivå 2; 20160331 (latmel)

Available from: 2016-09-29 Created: 2016-09-29 Last updated: 2018-07-10Bibliographically approved

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Melk, LatifaMouzon, JohanneAkhtar, FaridAntti, Marta-Lena

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