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Investigation of α-sialon formation by high temperature X-ray diffraction
Luleå tekniska universitet.
Luleå tekniska universitet.
Luleå tekniska universitet.
1994 (English)In: Key Engineering Materials, ISSN 1013-9826, E-ISSN 1662-9795, Vol. 89-91, p. 373-377Article in journal (Refereed) Published
Abstract [en]

A technique for following sialon formation in situ by high temperature x-ray diffraction (HT-XRD) was developed. The composition chosen for study was an yttrium α-sialon with x = 0.4. Powder compacts containing silicon nitride, aluminum nitride and yttria powders were pre-sintered at 1350 °C and then studied by HT-XRD at temperatures between 1450 and 1580 °C and nitrogen pressures of 0.11 MPa. The furnace was made from graphite coated with porous silicon nitride/silicon carbide. The coating prevented silicon carbide formation in the sample up to 1600 °C. X-ray diffraction results show the formation of a Y10Al2Si3O18N4 phase at 1350 °C, which dissolved to form α-sialon and other phases at higher temperatures. The amounts of α-sialon formed are similar to the amounts reported by other authors. An empirical method was used for the calculation of activation energy for the silicon nitride to α-sialon transformation and resulted in a value of 330 kJ mol

Place, publisher, year, edition, pages
1994. Vol. 89-91, p. 373-377
National Category
Other Materials Engineering
Research subject
Engineering Materials
Identifiers
URN: urn:nbn:se:ltu:diva-9671Local ID: 855d78e0-fc8f-11db-b816-000ea68e967bOAI: oai:DiVA.org:ltu-9671DiVA, id: diva2:982609
Note
Godkänd; 1994; Bibliografisk uppgift: Proceedings of the International Conference on Silicon Nitride-Based Ceramics, Oct 4-6 1993, Stuttgart, Germany ISBN 0-87849-668-8; 20070507 (cira)Available from: 2016-09-29 Created: 2016-09-29 Last updated: 2017-11-21Bibliographically approved

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