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High-performance epitaxial Na0.5K0.5NbO3 thin films by magnetron sputtering
Department of Condensed Matter Physics, Royal Institute of Technology.
Department of Condensed Matter Physics, Royal Institute of Technology.
Department of Condensed Matter Physics, Royal Institute of Technology.
2002 (English)In: Applied Physics Letters, ISSN 0003-6951, E-ISSN 1077-3118, Vol. 81, no 2, p. 337-Article in journal (Refereed) Published
Place, publisher, year, edition, pages
2002. Vol. 81, no 2, p. 337-
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Other Materials Engineering
Research subject
Engineering Materials
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URN: urn:nbn:se:ltu:diva-9838DOI: 10.1063/1.1492854ISI: 000176487400051Scopus ID: 2-s2.0-79956041960Local ID: 886460c0-3faf-11de-bc0c-000ea68e967bOAI: oai:DiVA.org:ltu-9838DiVA, id: diva2:982776
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Validerad; 2002; 20090513 (andbra)

Available from: 2016-09-29 Created: 2016-09-29 Last updated: 2018-07-10Bibliographically approved

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