The semiconductor industry demands high input/output (I/O) density, requiring sub-l0-micrometer microvia. Here we propose a novel, fully additive, economical approach for creating and copper plating of microvias. The experimental process consisted of three stages. In Stage I, a polyurethane layer was spin-coated onto a FR-4 PCB base, followed by target copper layer deposition using the sequential build-up-covalent bonded metallization (SBU -CBM) method. In Stage II, first another layer of polyurethane was spin-coated on the top of the target copper layer, and then a microvia was created on the polyurethane layer using a picosecond pulsed ultraviolet (UV) laser. Finally, in Stage III, the SBU-CBM method was used to selectively copper plating of the microvia. Optical microscopy and cross-section scanning electron microscopy (SEM) images confirmed the successful formation and copper plating of sub-l0 micrometer microvia.